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Shin-Etsu Chemical Co., Ltd. has announced that in order to expand its semiconductor lithography materials business, the company has decided to build a new plant in Isesaki City in Gunma Prefecture, Japan. The new factory, which will be Shin-Etsu's fourth production base in Japan, is also the company's first new domestic production base established in Japan in 56 years.
Shin-Etsu Chemical plans to invest approximately JPY 83 billion (USD 547 million) in Isesaki City, northern Tokyo, Gunma Prefecture, Japan to construct a factory covering an area of around 150,000 square meters, which is scheduled the first phase of investment to be completed in 2026.
The new base, which will produce photoresist and other materials used in semiconductor lithography processes, will become the strategic center for Shin-Etsu Semiconductor Materials, exporting to South Korea, the United States, and other regions. The company also plans to eventually conduct research and development there.
Japan has long held a strong global market position in upstream semiconductor aterial markets, especially in areas such as silicon wafers and photoresist, where its market dominance remains unshaken.
Shin-Etsu was founded in 1926, the company launched its photoresist business 1997 and started production of the then-most cutting-edge KrF photoresists at our Naoetsu Plant in Niigata Prefecture, Japan. Since then, it has developed semiconductor lithography materials such as photomask blanks, ArF photoresists, multilayer materials, extreme ultraviolet (EUV) resists and more. It established the second productin base in Fukui Prefecture in 2016 and the third production base in Yunlin County in the western part of Taiwan in 2019.
Shin-Etsu Chemical holds about 20% of the global photoresist market, especially in advanced product field, where it aims to capture at least 40% market share.
Editor：Lulu
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